Eco-Snow Systems is helping a major US photomask manufacturer save money and improve the quality of its photomasks and reticles with a cleaning technology designed for the 28nm DRAM half-pitch technology node.
Eco-Snow Systems, an affiliate of The Linde Group, is the leading supplier of automated, carbon dioxide (CO2)-based cleaning tools and processes to the semiconductor industry.
The photomask manufacturer has been using the Eco-Snow MaskClean® 150 technology for several months on masks now in production, as well as for development of the 28 nm node scheduled for production by 2014.
Joe Clark, General Manager of Eco-Snow Systems, said, “The new Eco-Snow MaskClean® 150 technology is a full mask cleaning tool that delivers significant cost savings.”
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