BOC Edwards is reporting significant progress in qualifying its PureFilm trimethylsilane in volume production.
The company’s electronic materials group says it has qualified its 99.999% trimethylsilane on both 200mm and 300mm platforms as the primary low k dielectric at semiconductor fabs in America. Additional product qualifications are still in progress.
Trimethylsilane is used in chemical vapour deposition processes for the development of low k dielectric thin film.
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